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Hidden Pitfall in EUV Multilayer Lifetime Evaluation: The Missing Long‑Term Steady‑State Reference Baseline

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Hong Kong, China, November 10, 2026 — Abstract Short‑pulse accelerated irradiation widely screens Ru‑capped, carbon‑interlayer and B₄C barrier modified Mo/Si multilayers for EUV lithography. Efficient for preliminary screening, pulsed high‑fluence tests differ physically from continuous… Read More »Hidden Pitfall in EUV Multilayer Lifetime Evaluation: The Missing Long‑Term Steady‑State Reference Baseline